| 초록 |
The decomposition of C2F6 in a mixture with N2 was investigated in a coaxial dielectric barrier discharge at atmospheric pressure. Here we showed effects of plasma parameters on the decomposition process, namely applied voltage, frequency, an initial fraction of C2F6, and total flow rate. An increase of the decomposition of C2F6 was due to a large value of applied voltage and frequency, or small value with the initial fraction and total flow rate. Although the absence of O2 in the feed gas, the main product was carbon oxides due to F atom etching of the silicon dioxide, dielectric barrier material, or moisture in the plasma system. Reaction pathways for C2F6 decomposition in the atmospheric pressure plasma were also suggested by optical emission spectroscopy analysis. |
