| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 가을 (10/09 ~ 10/10, 일산킨텍스) |
| 권호 |
33권 2호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
금속, 반도체, 세라믹, 및 고분자에서 적용 가능한 블록공중합체 나노리소그라피 |
| 초록 |
This study introduces a generalized block copolymer nanolithography, which is applicable to the most of earth’s matter including metals, semiconductors, ceramics and even polymers. Although block copolymer is considered to provide parallel nanopatterning process, which may overcome the resolution limit of conventional photolithography, it has been mostly applied to silicon based maters so far. It is largely due to the difficulty in controlling the orientation of those anisotropic nanoscale morphologies on an arbitrary substrate. Here, we present a generalized process to apply block copolymer lithography to various functional materials. We also present chemical patterning process for our universal block copolymer lithography, potentially useful to establish directed assembly techniques for well-ordered device-oriented functional nanostructures. |
| 저자 |
김지은, 정성준, 김봉훈, 신동옥, 박승학, 이형민, Xia, 뉘엠콕닷, 이덕현, 김상욱
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| 소속 |
KAIST |
| 키워드 |
block copolymer; nanolithography; metals; semiconductors; ceramics; polymers
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| E-Mail |
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