| 초록 |
The orientation of microphase-separated domains of diblock copolymer (BCP) thin films has been known to be affected by the roughness of a substrate. Although many researchers have reported the effect of roughness of the underlying substrate on the orientation of BCP microdomains, a systematic approach to well-defined roughness has not been well explored. In the present study, we introduce tunable roughness of a substrate with nanopatterns. To generate such well-defined nanopatterns, either hydrogen silsesquioxane (HSQ) patterns realized by the Atomic Image Projection E-beam Lithography (AIPEL) or silicon oxide patterns fabricated by the ordinary E-beam lithography were realized on wafer substrates. Employing such lithographic techniques, the period and amplitude of nanopatterns could be finely tuned. We observed the orientation change of BCP microdomains due to surface topographic patterns and examined the relationship between morphology of BCP thin films and surface roughness. |
