| 학회 |
한국재료학회 |
| 학술대회 |
2018년 가을 (11/07 ~ 11/09, 여수 디오션리조트) |
| 권호 |
24권 2호 |
| 발표분야 |
G. 나노/박막 재료 분과 |
| 제목 |
Capacitively Coupled O2 Plasma Treatment Effects on Zinc Oxide Thin Films Deposited Using Spray Pyrolysis at RF Power and Plasma Exposure Time |
| 초록 |
ZnO is a potential material for oxide semiconductor applications. Undoped ZnO films were deposited using a spray pyrolysis technique and the films were treated with capacitively coupled O2 plasma at different RF power and plasma process time. The ZnO sol concentration was 0.75 M. The samples were exposed to capacitively coupled O2 plasma at 80 mTorr. The RF power and exposed time were varied in the range of 0~150 W and 0~150 seconds, respectively. The ZnO films were investigated using contact angle measurement, Fourier transform infrared spectroscopy, X-ray diffraction, scanning electron microscopy, surface profilometry and atomic force microscope. The film thicknesses were measured as 0.9 and 1.4 µm at 400 and 500 ºC, respectively. The activation energy was 20.125 kJ/mol. The roughnesses of the film surfaces were 0.5~2.0 nm. The films deposited at 500 ºC provided smoother surface than those at 400 ºC. Transmittances of the films were about 80~90 % and optical energy bandgap were 3.29~3.3 eV, where the films deposited at 500 ºC brought higher optical bandgap energies than those at 400 ºC. I-V and UV response of the films also studied. The results will also be discussed during the talk. |
| 저자 |
박상혁, 정연욱, 황덕호, 이송욱, 박진표, 황선정, 이제원, 조관식
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| 소속 |
인제대 |
| 키워드 |
Plasma process; Spray pyrolysis; Zinc oxide; Oxygen plasma; Thin film
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| E-Mail |
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