| 학회 |
한국재료학회 |
| 학술대회 |
2010년 봄 (05/13 ~ 05/14, 삼척 팰리스 호텔) |
| 권호 |
16권 1호 |
| 발표분야 |
B. Nanomaterials Technology (나노소재기술) |
| 제목 |
Nanopatterns on various substrates using polystyrene-b-polymethyl methacrylate(PS-b-PMMA). |
| 초록 |
Diblock copolymers are macromolecular surfactants those are capable of spontaneous self organization into several ordered micro phases, depending principally on molecular composition, if the constituents are sufficiently incompatible. High density arrays of nanostructures over large area can be formed by self-assembly of block copolymers on a variety of substrates such as silica deposited silicon wafer, glass, GaN, PET etc. This block copolymer thin films, such that the domains are oriented perpendicularly to the substrate, is particularly useful for the formation of templates for patterns. The degradation and elimination of the minor component transforms the material into an array of nanopores to form some patterned template that offer potential benefits in a number of applications. The morphology of the polymer surface is strongly dependent on the thickness of the polymer layer. Moreover it is necessary to control the size and shape in order to get the desired properties. Spin coating fallowed by baking the polymer solution onto the substrate self assembles the components of the polymer. PS and PMMA have significantly different photodegradation properties. Exposure to ultraviolet radiation degrades the PMMA (polymethyl methacrylate) chain that can be removed by rinsing in acetic acid giving patterned holes. But the small size of hole limits the template to several applications. This problem can be solved by sonicating the sample in different solution in different steps which gives fingerprint pattern or sometimes patterns with PS cylindrical domains with large interstitial spaces with an average of more than 30nm. Deposition of gold on this kind of pattern followed by dry etching and subsequent removal of silica can produce gold nanopattern on silicon wafer. Photonic crystal can be fabricated using same kind of pattern while deposition of gold followed by removal of PS regions can give transparent conducting devices of glass substrates. The morphology of the polymer film surface was studied using atomic force microscopy (AFM) and scanning electron microscopy (SEM). |
| 저자 |
Md. Mahbub Alam1, Yu Rim2, Lee1, Woo Gwang2, Jung1
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| 소속 |
1Department of Advanced Materials Engineering, 2Kookmin Univ. |
| 키워드 |
block copolymer; nanopattern; thickness; degradation; sonication; fingerprint pattern.
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| E-Mail |
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