| 학회 |
한국재료학회 |
| 학술대회 |
2017년 봄 (05/17 ~ 05/19, 목포 현대호텔) |
| 권호 |
23권 1호 |
| 발표분야 |
5. 나노공정과 메타물질(Nano-fabrication and meta-materials) |
| 제목 |
Brush-controlled self-assembly speed of high-χ block copolymers |
| 초록 |
Realization of highly-ordered patterns of block copolymers (BCPs) has attracted much attention as one of the promising candidates for future lithography owing to the high pattern resolution, scalability, and good cost-effectiveness. The BCPs can self-assembled into well-ordered patterns with a small feature size of 5 – 50 nm, such as dot, line, hole, and ring nanostructures. However, there are still critical issues to be solved for wide applications of BCPs with high Flory-Huggins interaction parameter (χ) such as their slow self-assembly kinetics and pattern formation on a small area. To solve these problems, we here introduce how to improve the self-assembly kinetics of poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) BCPs with a high-χ (~ 0.26) by precisely controlling the molecular weight (MW) and weight percent of a hydroxyl-terminated polystyrene (PS-OH) homopolymer. We systemically analyzed how MW and weight percent of PS-OH brush affect BCPs self-assembly speed. Furthermore, we also found optimum surface modification condition for PS-b-PDMS BCPs with various MWs and volume fraction. In addition, we realized aligned sub-20 nm line and dot pattern over the large area within 5 minutes in the trench (width~1 μm) by using binary solvent annealing at optimum PS-OH brush condition. We suggest this simple and facile brush-engineering method can be extendable to other BCPs based systems, contributing to the real industry applications of BCPs. |
| 저자 |
최영중, 박태완, 정영훈, 홍연우, 조정호, 박운익
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| 소속 |
한국세라믹기술원 전자소재부품센터 |
| 키워드 |
block copolymer; directed self-assembly; surface modification; solvothermal annealing; solution process
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| E-Mail |
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