| 초록 |
Poly(4-hydroxystyrene)-based protected polymer is generally used as a photoresist material because of its good transmittance and low absorption rate so that a pattern can be formed up to the interface of the resist substrate. The purpose of this study is to synthesize poly(4-hydroxystyrene)-based copolymers by anionic polymerization that can control the polymer structure, molecular weight, and molecular weight distribution, and to evaluate the physical properties before and after deprotection reaction. In the experiment, protected 4-hydroxystyrene-based monomers were anionically polymerized using s-BuLi as an initiator at a temperature of -40℃ for 3 days. As a result, a polymer having a molecular weight of about 10 kg/mol and molecular weight distribution of 1.1 level was obtained. Finally, poly(4-hydroxysstyrene) was prepared through a deprotection reaction under mild conditions. |
