| 학회 | 한국화학공학회 |
| 학술대회 | 2012년 가을 (10/24 ~ 10/26, 부산 BEXCO) |
| 권호 | 18권 2호, p.1655 |
| 발표분야 | 공정시스템 |
| 제목 | Modeling of Single Wafer Cleaning System with Supercritical CO2 Drying |
| 초록 | Single wafer cleaning is intorduced ofr high partical removal efficiency and low particle reattachment possibility. But, some trials end up with failures such as water mark defects during iso-propyl alcohol evaporation phase. Superciriticla CO2 (ScCO2) is known as one of solvents for decrease in failure due to zero surface tension, low viscosity, and high diffusivity. In single wafer cleaning process, supercritical CO2 is supplied to the surface of wet wafers with IPA serving as a rinse agent. IPA on the surface of wafers dissolves in supercritical CO2. After removal IPA from wafers, the pressure in the drying chamber returns to the atmospheric pressure and gasifies and CO2 is purged from the chamber. In this study, single wafer cleaning system with ScCO2 is identified and simulated for the analysis. This research was supported by grant from the LNG Plant R&D Center funded by the Ministry of Land, Transportation and Maritime Affairs (MLTM) of the Korean government. |
| 저자 | 김정남, 이 웅, 한종훈 |
| 소속 | 서울대 |
| 키워드 | Single Wafer Cleaning; Superciritical CO2 |
| 원문파일 | 초록 보기 |
