| 초록 |
In this study, a simple route for the preparation of thin films with patterned structures and controlled optical properties was described using the photodecomposition of photosensitive templates covalently bonded to poly (methylsilsesquioxane) polymers. A synthetic procedure of poly (methylsilsesquioxane) containing photosensitive moiety is provided, where the adamantylphenol group is used as a covalently bonded template. Patterned structures were achieved using UV lithography with photosensitive silsesquioxane. Through the formation of various patterns by UV irradiation, it is found that the formation of negative pattern is due to photodecomposition of adamantane group. These studies show that pattern contrasts, optical properties, and surface properties such as hydrophilicity can also be controlled by the incorporated adamantane concentration, UV exposure time, UV dosage, and post-thermal treatment. |
