| 학회 | 한국고분자학회 |
| 학술대회 | 2002년 가을 (10/11 ~ 10/12, 군산대학교) |
| 권호 | 27권 2호, p.354 |
| 발표분야 | 특별 심포지엄 |
| 제목 | Control of Surface Morphology in Block Copolymer Thin Films |
| 초록 | The structure of symmetric diblock copolymer thin films is governed by boundary conditions, such as commensurability and interfacial interactions. For thin films having lamellar morphology, film thickness is quantized to nL0 (where n is an integer and L0 is the bulk equilibrium lamellar period) in case of symmetric wetting or (n+1/2)L0 in case of asymmetric wetting. If the initial film thickness is not commensurate with this constraint, either holes or islands of height L0 are formed. In our previous works, unusual hierarchical structures of polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) thin films were induced by residual solvent after annealing above Tg. In order to investigate how to reduce lateral strains imposed on the hole layer, PS-b-PMMA/PPO thin films were prepared. It is well known that PPO (poly (1,4-dimethyl 2,6-phenylene oxide)) is very miscible with PS block of PS-b-PMMA block copolymer (ΧPS-PPO0). By adding PPO to block copolymer, L0 in bulk state was increased and the hierarchical structures of thin films were effectively suppressed. Surface morphology was investigated using small angle x-ray scattering (SAXS), optical microscopy (OM) and atomic force microscopy (AFM). |
| 저자 | 박정연, 김상철, 차국헌 |
| 소속 | 서울대 |
| 키워드 | |
