| 학회 | 한국고분자학회 |
| 학술대회 | 2003년 봄 (04/11 ~ 04/12, 연세대학교) |
| 권호 | 28권 1호, p.285 |
| 발표분야 | 특별 심포지엄 |
| 제목 | Nanoscopic template induced from self-assembly of block copolymer |
| 초록 | Due to the miniaturization of electronic, optoelectronic, and magnetic devices, nanometer-scale patterning of materials at low cost is an important objective of current science and technology. One promising route for patterning nanostructures is the use of self-organizing systems. The use of block copolymers as templates for the fabrication of novel nanostructured materials has flourished due to the ease with which such templates can be prepared, and functionalized, and to the variety of distinct nanostructures that can be generated from copolymer morphologies. In recent reports, Polystyrene-Poly methyl methacrylate diblock copolymer with cylindrical structure (T. P. Russeell, et al.) and Polystyrene-Polybutadien diblock copolymer with cubic structure (R. A. Register, et al.) showed the availability of applying block copolymer as template with order of nanomaters. In spite of their ultraradense periodic structure, the domain size is not sufficient for practical use and moreover in the case of the cylindrical structure, some techniques are in need for orientation perpendicular to the surface. In this account, we set a goal to produce nanoscopic template with large area domain size using other block copolymers and to apply the nanoscopic template to devices with ultra-high information density. |
| 저자 | 권기영;최대근;양승만;정희태 |
| 소속 | KAIST;KAIST;KAIST;KAIST |
| 키워드 | block copolymer; self-assembly; |
