| 학회 | 한국화학공학회 |
| 학술대회 | 2010년 가을 (10/21 ~ 10/22, 대전컨벤션센터) |
| 권호 | 16권 2호, p.2208 |
| 발표분야 | 촉매 및 반응공학 |
| 제목 | Preparation of N-doped TiO2 Thin Film Deposited by PECVD and Evaluation of Its Photocatalytic Characteristics |
| 초록 | Titanium Dioxide is now being used in practical applications such as self-cleaning, sterilization, deodorizing and air-cleaning. Unfortunately, the relatively large bandgap of TiO2 (3.2eV for the anatase phase) requires ultraviolet (UV) light for electron-hole separation, which is only 5% of the natural solar light. It is conceived from the literature knowledge that the modification of the band structure is essential to alter the light absorption characteristics of the TiO2. In this study, N-doped TiO2 thin film was deposited onto slide glass by PECVD process with TTIP as a precussor, N2 and O2 gas as a reactive gas for 4hr at 400℃. The optimal condition of fabricating N-doped TiO2 thin film was investigated at various Rf discharge power, flow rate. The chemical state and crystallity of N-doped TiO2 thin film were examined by XRD and ESCA. Photocatalyst activity of N-doped TiO2 thin film was investigated by decomposition of acetaldehyde and methylene blue. |
| 저자 | 박 준1, 조명덕1, 박유정1, 정경운1, 송선정2, 임경택1, 조동련1 |
| 소속 | 1전남대, 2BK21 기능성나노신화학소재사업단 |
| 키워드 | 플라즈마; 광촉매 |
| 원문파일 | 초록 보기 |
