| 학회 |
한국고분자학회 |
| 학술대회 |
2018년 가을 (10/10 ~ 10/12, 경주컨벤션센터) |
| 권호 |
43권 2호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Tailored Multiphoton Photopolymerization to Integrate Desired Properties in Functional Microstructures |
| 초록 |
Two-photon lithography is a power lithographic technique that facilitates the fabrication of complex 3D structure. This technique relies on two-photon sensitized polymerization to fabricate functional microstructures for photonics, MEMS applications and biotechnology. The form of the structure contributes to its eventual application. Different applications have different demands on the smallest feature size on the structures and/or their mechanical properties. In this presentation two different approaches are outlined to achieve these above goals. The first one involves controlling the formulation of photoresists and the second involves optimizing the parameters involved during lithographic process itself. The discussion involves how to achieve high resolution while maintaining good mechanical stability of microstructures in urethane acrylate photoresists and achieving swelling dependent actuation in hydrogel-based photoresists. |
| 저자 |
PREM PRABHAKARAN |
| 소속 |
Hannam Univ. |
| 키워드 |
two-photon; polymerization; microstructures
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| E-Mail |
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