화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2011년 봄 (04/07 ~ 04/08, 대전컨벤션센터)
권호 36권 1호
발표분야 반도체용 고분자소재
제목 Extremely large tunability of self-assembled block copolymer patterns for nanolithography applications
초록 The morphology and length scale of the microdomain arrays in block copolymers (BCPs) are determined by the chain lengths, and thus to obtain different geometries and feature sizes, polymers with different chain lengths or BCP/homopolymer blends have been employed. In this talk, we report on the systematic tunability of pattern dimension and morphology by controlling the solvent-annealing conditions, where the key parameters are choice of solvent vapors, vapor pressure, and the mixing ratio of selective solvent vapors. Vapor pressure can control the degree of solvent uptake in the film, which changes both the chain mobility and the interfacial interaction between the two blocks. It is possible to independently control both the pattern width and the periodicity by using a mixed vapor of selective solvents. This talk suggests a way to relieve the constraints on the achievable microdomain pattern geometries.
저자 정연식
소속 KAIST
키워드 block copolymer; self-assembly; lithography
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