| 학회 | 한국공업화학회 |
| 학술대회 | 2013년 가을 (10/30 ~ 11/01, 대전컨벤션센터) |
| 권호 | 17권 2호 |
| 발표분야 | 포스터-화학공정 |
| 제목 | Continuous process manufacturing and research of etching solution of non-hydrofluoric acid on dip system |
| 초록 | The emphasis on products for mobile smart device attributes that are portable, it needs to be thinner and lighter display. Slimming of LCD and AMOLED display device module is also faced with the same demands. But among these components, circuits and other components almost to the limit of the material thinning was approaching. In order to achieve thinner Modules to thin glass substrate is essential. Therefore, we studied the non-HF etching solution on the dip system. Dip system facilitates the mass production and competitive prices are high. However, many mass-produced as etchant consumption process is likely to cause errors. due to adhesion sludge defective surface can occur. This ratio of hydrofluoric acid etching solution to minimize the consumption of etchant continuous process system was studied. In addition, by adding a surfactant to reduce the sludge poor adhesion method was studied. |
| 저자 | 장재민, 이철태, 김정민 |
| 소속 | 단국대 |
| 키워드 | nonHF; nonhydrofluoric acid; slimming; etching; LCD; dip system |
