| 학회 | 한국고분자학회 |
| 학술대회 | 2005년 봄 (04/14 ~ 04/15, 전경련회관) |
| 권호 | 30권 1호, p.204 |
| 발표분야 | 복합재료 |
| 제목 | Fabrication of Patterned Inverse Opals by using Multiple Photo-lithography |
| 초록 | For advanced photonic application, we need to discover the novel concepts for patterned inverse opal structure. Because, the colloidal crystallization is intrinsically spontaneous process, soft- or photo-lithographic approach is suggested to guide a patterning into designed features. Several recent studies have been reported on the fabrication of patterned inverse opals but, there are still remained problems on precise pattern formation, economic processability and 2-dimensional defect insertion1. For the color tuning of inverse opals, some research groups suggested their own solutions, but most of them are not permanent color change but only during they were swelled because they use the solvents for refractive index mismatch2. Even more, there have not been the efforts for simultaneous process of multi-color patterning and tuning by simple procedure. Now, we present the unique idea for patterning and tuning of the inverse opals at the same time and which is based on the colloidal templating and photo-lithography. In our approach, there are two key-steps for patterning and tuning the inverse opals. For the first, inverse opals which are made of hard-baked SU-8 photoresist were generated from dip-coated silica colloidal film template. After filling the macro pores with SU-8 again, they are soft-baked and readied to be patterned by conventional photo-lithography process. Second, by controlling the amount of photon dose, we can modulate the degree of development and it causes effective refractive index differences. As a consequence, refractive colors of those inverse opal patterns are tuned according to the UV exposure time. Although, those two steps are explained separately, they occurred simultaneously in actual process. References 1. B. H. Juarez, D. Golmayo, P. A. Postigo and C. Lopez, Adv. Mater., 16, 1732 (2004) 2. E. Palacios-Lidon, J. F. Galisteo-Lopez, B. H. Juarez and C. Lopez, Adv. Mater., 16, 341 (2004) 3. P. Jiang, D. W. Smith Jr., J. M. Ballato and S. H. Foulger, Adv. Mater., 17, 179 (2005) |
| 저자 | 이승곤1, 이기라2, 양승만1 |
| 소속 | 1한국과학기술원 / 생명화학공학과 초격자나노소재연구실, 2LG화학 기술 (연) |
| 키워드 | multiple photo-lithography; patterned inverse opals; refractive index matching; dip-coating |
