| 학회 |
한국공업화학회 |
| 학술대회 |
2016년 가을 (10/26 ~ 10/28, 제주국제컨벤션센터(ICCJEJU)) |
| 권호 |
20권 2호 |
| 발표분야 |
석유화학윤활유_포스터 |
| 제목 |
Syntheses of azobenzene derivatives for an amphoteric surfactant with a photosensitive characteristics |
| 초록 |
Azobenzene moiety can be easily photoisomerized by UV/Vis light irradiation and physical properites of surfactant with the group caused a significant difference due to these cis-trans isomerization. Therefore, we have designed and synthesized a new amphoteric surfactant material having a azobenzen group. Physical properties of the synthesized surfactants have studied with respect to changes before and after the UV/vis light irradiation - critical micelle concentration(cmc), emulsion stability, foaming test, surface tension. |
| 저자 |
강충호1, 심대선1, 조정은1, 한혜림1, 이기환2, 강호철1
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| 소속 |
1한국화학(연), 2공주대 |
| 키워드 |
Azobenzene; anionic surfactant; surface activity; photoisomerization
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| E-Mail |
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