| 초록 |
In order to make a procise measurment of the film thickness with atomic resolution, the uncertainty of transmission electron microscope (TEM, JEOL, JEM-ARM200F installed in National Nanofab Center) was estimated using standard operation procedure (SOP) and standard calibration process (SCP) which were summarized by referring to the ISO 20263[1] and ISO 29301[2]. Uncertainty factors such as definition (film thickness, interface, interface width), calibration (reference materials, uncertainty of reference material), TEM (alignment, aberration, resolution, magnification, focus), specimen (thickness, alignment_zone axis, damage), camera (size, nm/pixel, point distribution function), and measuring process (repeatability, pixels, interface and surface roughness) are being inverstigated. In this presentation, we’ll discuss about the uncertainty factors how to measure the thickness of thin films on Si substrate with atomic resolution with repeatability and reproducibility. References [1] International Standard Organization (ISO 20263), Microbeam analysis – Analytical electron microscopy - Method for determination of interface position in the cross-sectional image of the layered materials. [2] International Standard Organization (ISO 29301), Microbeam analysis – Analytical transmission electron microscopy- Method for calibration image magnification by using reference materials having periodic structures. |
