| 초록 |
Thin film encapsulation (TFE) was fabricated via alternative process of initiated chemical vapor deposition (iCVD) and atomic layer deposition (ALD). The TFE was highly transparent and exhibited outstanding barrier property. With 5 dyads of the alternating organic/inorganic multilayer, the water vapor transmission rate (WVTR) was as low as 1.07 x 10-4 g/m2/day at accelerated condition of 38oC and 90% relative humidity (RH). The WVTR value corresponds to 4.95 x 10-6 g/m2/day at ambient condition. The TFE maintained its barrier property even after flexing test, and when applied on organic photovoltaics (OPV), the lifetime of the device was elongated for more than 200 times. |
