| 학회 |
한국재료학회 |
| 학술대회 |
2015년 가을 (11/25 ~ 11/27, 부산 해운대그랜드호텔) |
| 권호 |
21권 2호 |
| 발표분야 |
G. 나노/박막 재료 |
| 제목 |
Fabrication of Subwavelength ZnO Nanograting using Combined Nanoimprint and Atomic Layer Deposition (ALD) Method |
| 초록 |
Subwavelength gratings have received a lot of attention due to their potential applications including anti reflection coating. One of the important advantage of the subwavelength gratings is their tunable reflection and transmission capability by manipulating their physical geometry such as period, fill factor etc. In this study, we combined the nanoimprint lithography and atomic layer deposition (ALD) to fabricate the subwavelength nanogratings and investigated the transmission and reflection characteristics of the grating by changing the fill factor of the grating. The fill factor of the grating was precisely changed by using the ALD and UV-VIS spectrum was measured by varying the fill factor. The optical characteristics of the subwavelength grating were also calculated using finite-difference time-domain (FDTD) calculation. The FDTD calculation and UV-vis spectroscopy revealed the tunability of the narrowband spectral profile. |
| 저자 |
J.-R. Jeong, D. Viet, C. V. Phuoc, R. Kuchi, S. Surabhi
|
| 소속 |
충남대 |
| 키워드 |
Subwavelength grating; Nanoimprint; ALD; ZnO
|
| E-Mail |
|
