| 초록 |
3D Nanofabrication with Solid-index Phase Masks Junyong Park, Eunhye Kim, and Seokwoo Jeon* Dep. of Materials Science and Engineering, KAIST PnP offers an easy route to fabricate various three-dimensional (3D) nanostructures using elastomeric and conformable phase masks in a single exposure step.[1] Still, the difficulty to make high relief structured phase mask limits patterning capabilities of 3D nanostructures in structural diversity and uniformity. In this work, Si masters and high modulus PUA to generate high resolution phase masks help to form defect-free micropillar arrays with a high aspect ratio (＞6) and a narrow spacing (~120 nm). Thin coating of pdms on the replicated PUA phase mask improves conformal coating to achieve uniform 3D structures. By using those 3D structures, we have demonstrated antireflection coatings[2] and broadband absorption films.[3] Optical properties from those coatings and films will be presented with in-depth analysis of optical responses. |
