| 학회 |
한국고분자학회 |
| 학술대회 |
2009년 가을 (10/08 ~ 10/09, 광주과학기술원 오룡관) |
| 권호 |
34권 2호 |
| 발표분야 |
고분자 합성 |
| 제목 |
Synthesis of ArF photoresist by reversible addition-fragmentation chain transfer (RAFT) polymerization through semi-batch system |
| 초록 |
Controlled/living radical polymerizations (CRPs) can make a product which has designed molecular weight, low molecular weight distribution and well defined structure. More than these advantages over free radical polymerization (FRP), CRPs make superior product than FRP sometimes, due to their different polymerization mechanism; growth of chains during total period of polymerization. Semi-batch polymerization system can make the products yielded by the two polymerizations very different, because monomers injected during polymerization cannot be propagated after growing chains under FRP condition, but can be propagated under CRP condition. In this study, ArF photoresist was synthesized via reversible addition-fragmentation chain transfer (RAFT) polymerization, one of well-defined controlled/living radical polymerization, through semi-batch system. Three methacrylate monomers were copolymerized under different conditions. Characterizations of the product by GPC and 1H-NMR were done. |
| 저자 |
손해성1, 차상호1, 이원기1, 김동균1, 이종찬1, 김명선2, 윤효진2, 백세경2, 김수경2, 함지윤2, 김영호2, 채승기2, 이준경3, 이재우3, 김재현3
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| 소속 |
1서울대, 2삼성전자(주), 3동진쎄미켐(주) |
| 키워드 |
RAFT; living polymerization; ArF; photoresist
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| E-Mail |
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