| 초록 |
Polymer thin films of octafluoronaphthalne were prepared via RF plasma polymerization in continuous mode and characterized by FT-IR, UV-VIS, XPS and contact angle analysis, and deposition rates were measured by α-step. First, the plasma polymerization conditions such as monomer vaporization temperature and plasma power were optimized in order to have polymer thin films with good chemical resistant, high thermal stability and low dielectric constant. The chemical resistant was evaluated by measuring solubility in solvents such as acetone, toluene, TCE, NMP, and DMSO. After optimization of conditions in continuous mode, pulse mode plasma polymerization was also employed, in which duty cycle and plasma power were varied. |
