초록 |
Polymer thin films of phthalic anhydride were prepared via RF plasma in a continuous-wave (CW) mode and the plasma polymerization conditions such as monomer vaporization temperature, plasma power and time were optimized. First, vaporization temperature was optimized by analyzing the polymer thin films with DSC and AFM, while the plasma power was optimized by evaluating solubility of the polymer thin films in solvents such as toluene, acetone, NMP and DMSO. Secondly, the polymer thin films were characterized by FT-IR, UV-VIS and TGA, and deposition rates were also measured by α-step. For comparison, pulse mode plasma polymerization was also utilized in order to maximize the retention of monomer functionalities and the duty cycle at the optimized conditions (120℃, 10W and 20min) was varied in order to maximize retention of anhydride functional groups. The polymer films from pulse mode plasma polymerization were also characterized by FT-IR, UV-VIS and TGA, and the results were compared to those from continuous mode plasma polymerization. |