| 학회 |
한국고분자학회 |
| 학술대회 |
2013년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
38권 2호 |
| 발표분야 |
기능성 고분자 (포스터발표만 진행) |
| 제목 |
Synthesis of Phosphonic Acid End-Functionalized PS-r-PMMA Random Brush Polymers for Neutral Surface |
| 초록 |
Here we report the first phosphonic acid end-functionalized PS-PMMA random copolymer for neutral brush which is used for perpendicular microdomain orientation of lamella-forming PS-b-PMMA . The phosphonic acid group is a stronger anchoring group than hydroxyl group and used to end-graft the chains to the silicon oxide wafer. By using this anchoring group, we could reduce the annealing time from 24 h to less than 5 min to achieve neutral surface for perpendicular orientation of lamella forming PS-b-PMMA. The phosphonic acid-functionalized PS-r-PMMA random copolymers were prepared with low polydispersity by a “living” nitroxide mediated radical polymerization technique using a unimolecular initiator based on TEMPO group. Especially, we developed an efficient synthetic route toward suitable alkoxyamine initiator functionalized phosphonate groups, which have no effect on polymerization. The hydrolysis of the phosphonate group results in a phosphonic acid. |
| 저자 |
강나나1, 문봉진2, 주원태2, 김석호2, 이수미3, 강민혁3
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| 소속 |
1서강대, 2서강대 화학과, 3삼성디스플레이 |
| 키워드 |
phosphonic acid; neutral brush; block copolymer self-assembly
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| E-Mail |
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