| 초록 |
Soft-lithography has advancing with needs of more cheap and convenient lithography than photo-lithography. In these reasons, inorganic-organic hybrid resins can be adopted for making patterns as a mask. In this study, we make the hybrid resin which consist of monodispersed silica particles and a ground of Poly(ethylene glycol)-block-poly(propylene glycol)-block-poly(ethylene glycol) (P123) chains. Hybrid resin was synthesized by sol-gel reaction of tetraethoxysilane(TEOS) and Pluronic P123 (EO20PO70EO20). The sol-gel reaction proceeded with the substrate in the solution for durable adsorption of resin by weak chemical bonding. So we do not need to another coating process. To achieve the pattern on the substrate, silica particles were selectively etched by well-known etching solution. It is possible that the size of etched pore is controllable with the size control of silica particles and the size of pattern is controllable with the proportion of P123. |
