| 초록 |
Soft-lithography has some advantages such as convenient process and cheap cost, comparing with photo-lithography. In these reasons, inorganic-organic hybrid resins can be adopted for making patterns as a mask. In this study, we make the hybrid resin which consists of silica domains with noble metal clusters in the core of silica and entire ground of polymers such as P123 or PS-b-P2VP. Selective isotropic etching makes hemisphere-shaped holes on the surface of silicon wafer. And we add noble metal clusters in the core of the silica domains in order to make deep nano-sized holes by metal-assisted chemical etching. |
