| 학회 |
한국재료학회 |
| 학술대회 |
2010년 봄 (05/13 ~ 05/14, 삼척 팰리스 호텔) |
| 권호 |
16권 1호 |
| 발표분야 |
B. Nanomaterials Technology (나노소재기술) |
| 제목 |
Synthesis of Ni doped SiO2 Thin Film by Sol-Gel Process for Photonics |
| 초록 |
Ni doped SiO2 nanoparticles have been synthesized using a reverse micelle technique combined with metal alkoxide hydrolysis and condensation. The size of the particles and the thickness of the coating can be controlled by manipulating the relative rates of the hydrolysis and condensation reaction of TEOS within the micro-emulsion. The average size of synthesized Ni doped SiO2 nanoparticles was about in the size range of 15-25 nm and Ni particles 1-5 nm. Coating of Ni doped SiO2 were prepared on glass substrate using dip-coating technique. The properties of coating are studied under various firing conditions and discussed in connection with structural change of the films. |
| 저자 |
Dong Hae Lee1, Jeong Hun Son2, Dong Sik Bae1
|
| 소속 |
1School of Nano & Advanced Materials Engineering, 2Changwon National Univ. |
| 키워드 |
Ni doped SiO2 particles; Thin Films; Sol-gel processing; Dip-coating
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| E-Mail |
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