| 초록 |
In this study, we investigated the development of the morphology in block copolymer thin film after rapid quenching from the disordered state. Polystyrene-block-polyisoprene (PS-b-PI; Mw = 35.8 k, fPI = 0.67) thin films were spin-coated on silicon wafers. Upon heating this polymer exhibits HPL, DG and Hex morphology in sequence before melting. In-plane morphology of the thin film was investigated by using transmission electron microscopy (TEM), grazing incidence small-angle X-ray scattering (GISAXS). HPL phase appears a kinetically favored phase to be formed from the disordered state in thin film. |
