초록 |
Methylsilsesquioxane (MSSQ) films are chemically modified in two ways, by the bulk incorporation of a carbon bridged silicon or surface treatment of an NH3 plasma, and the effects of the chemical modification on the mechanical properties were investigated. A copolymer was synthesized by the incorporation of 10 mol% 1,2-bis(trimethoxysilyl)ethane (BTMSE) to methyltrimethoxysilane (MTMS). An NH3 plasma treatment was applied to MSSQ films for treatment times of 5, 15, 30 and 60 minutes. Films were characterized using Scanning electron microscopy (SEM), Fourier-transform infrared spectroscopy (FT-IR) and ellisometry. Depth-sensing indentation was used to determine films modulus and hardness. Indentaion load-displacement traces were used in conjunction with SEM images of residual indentation damage to determine the threshold load for cracking. |