화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2003년 봄 (04/11 ~ 04/12, 연세대학교)
권호 28권 1호, p.73
발표분야 특별 심포지엄
제목 Improvement in the Mechanical Properties of Low-k Organosilicate Thin Films
초록 Methylsilsesquioxane (MSSQ) films are chemically modified in two ways, by the bulk incorporation of a carbon bridged silicon or surface treatment of an NH3 plasma, and the effects of the chemical modification on the mechanical properties were investigated. A copolymer was synthesized by the incorporation of 10 mol% 1,2-bis(trimethoxysilyl)ethane (BTMSE) to methyltrimethoxysilane (MTMS). An NH3 plasma treatment was applied to MSSQ films for treatment times of 5, 15, 30 and 60 minutes. Films were characterized using Scanning electron microscopy (SEM), Fourier-transform infrared spectroscopy (FT-IR) and ellisometry. Depth-sensing indentation was used to determine films modulus and hardness. Indentaion load-displacement traces were used in conjunction with SEM images of residual indentation damage to determine the threshold load for cracking.
저자 김수한;Yvete Toivola;Robert F. Cook;주상현;이진규;윤도영;차국헌
소속 서울대
키워드 MSSQ; Low-k; Nanoindenter
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