| 학회 |
한국화학공학회 |
| 학술대회 |
2008년 봄 (04/23 ~ 04/25, 제주ICC) |
| 권호 |
14권 1호, p.154 |
| 발표분야 |
공정시스템 |
| 제목 |
Combined Run-to-Run and Real-time Multivariable Control for Wafer Temperature Uniformity in a 12-inch RTP Equipment |
| 초록 |
A combined run-to-run (R2R) and LQG control method has been proposed for a rapid thermal processing (RTP) equipment. The standard LQG objective was modified to include a quadratic penalty term for input deviation from a bias value, which provides the handle of R2R control for improvement of the wafer temperature uniformity. The LQG technqiue has been applied to a commercial 12-inch rotating RTP equipment and resulted in quite precise control performance. Combined R2R and real-time LQG control technique was applied to a non-rotating thermocouple-attached wafer and found to perform as anticipated. |
| 저자 |
원왕연1, 윤우현1, 이광순1, 지상현2, 나병철2, 이세찬1
|
| 소속 |
1서강대, 2Kornic Systems Corporation |
| 키워드 |
Rapid thermal processing; LQG control; Run-to-Run control; Multivariable control
|
| E-Mail |
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| 원문파일 |
초록 보기 |
