| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 봄 (04/07 ~ 04/08, 대전컨벤션센터) |
| 권호 |
36권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
High Aspect Ratio Nanoporous Templates Using Silicon-Containing Block Copolymers |
| 초록 |
Well defined nanoporous templates with high aspect ratios are highly desirable for a variety of applications. In this study, we combined bilayer approach with block copolymer lithography. This system consists of a top silicon-containing block copolymer layer and an underlying SU-8 layer into which the nanopatterns of block copolymers are transferred by oxygen reactive ion etching. This nanoporous template can be applied to the fabrication of nanorods and nanotubes using electrodeposition and atomic layer deposition. The results will be described in detail. |
| 저자 |
조경천1, 김진백1, 구세진1, 권세훈2, 박창홍1, 최지환2
|
| 소속 |
1한국과학기술원, 2부산대 |
| 키워드 |
block copolymer; nanorod; nanotube
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| E-Mail |
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