| 초록 |
Polymer has been widely used for the pattern transfer layer for various lithography techniques. Especially for the nanoimprint and the soft lithography, Behavior of polymer fluid has an important role to define the resulted feature. However, polymer has a surface tension itself, so for the thin layer of polymer fluid, dewetting occurs to attain equilibrium state to minimize surface energy. Previously, polymer dewetting phenomena have been investigated in many ways such as interaction between related with surface chemistry, polymer chain conformation and surface topology. In this study, we focused on dewetting phenomena of Polystyrene (PS) in the condition of soft lithography process with physically confined polydimethylsiloxane (PDMS) molds. Especially the effect of annealing time, film thickness and molecular weight of PS on the condition of patterning and the profile of the final pattern were investigated in detail. |
