화학공학소재연구정보센터
학회 한국화학공학회
학술대회 2011년 봄 (04/27 ~ 04/29, 창원컨벤션센터)
권호 17권 1호, p.250
발표분야 미립자공학
제목 Preparation of TiO2/SiOx Double-Layer Films on Particlesand Its Application to Phenol Removal
초록 The TiO2/SiOx double-layer films were coated on the polypropylene (PP) beads by a rotating cylindrical plasma chemical vapor deposition (PCVD) process and the photocatalytic activity of double-layer films was tested for the photodegradation of phenol in aqueous solution.The thickness of TiO2/SiOx double-layer could be controlled easily by the deposition time.The photodegradation rate of phenol by double-layer films on the PP beads increases as the initial phenol concentration increases or as the number of PP beads coated with double-layer films increases in aqueous solution.The presence of the SiOx bottom-layer improved the photocatalytic activity of the TiO2 layer because it may act as a trap for electrons generated in the TiO2 layer, thus, preventing the electron-hole recombinations.The rotating cylindrical PCVD process can be a good method to coat the high-quality double-layer films on the particles.It is proposed that the particles coated with double-layer films can be applied to the removal of water pollutants with high efficiency.
저자 Pham Hung Cuong, 김교선
소속 강원대
키워드 미립자 코팅; 플라즈마 반응기; 광촉매 반응
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