| 학회 | 한국화학공학회 |
| 학술대회 | 2015년 봄 (04/22 ~ 04/24, 제주 ICC) |
| 권호 | 21권 1호, p.973 |
| 발표분야 | 재료 |
| 제목 | Synthesis of SiOxCy thin film with Dielectric Barrier Discharge Plsma |
| 초록 | Atmospheric pressure- Dielectric Barrier Discharge(DBD) Plasma was recognized as promising and cost effective methods for wide-area surface treatment on sheets of steel, glass, polymeric web, etc. In this study, SiOxCy thin films were deposited by using dielectric barrier discharge plasma. The characteristic of SiOxCy thin films were investigated as afunction of the HMDSO/O2/He flow rate. The SiOxCy thin films were characterized by the Fourier-transformed Infrared(FT-IR) spectroscopy, Auger Electron Spectroscopy(AES), Field Emission Scanning Electron Microscope(FE-SEM), and X-Ray Diffraction(XRD). Detailed experimental results will be demonstrated through th present work. |
| 저자 | 오승천, 신중욱, 류재홍 |
| 소속 | 고등기술(연) |
| 키워드 | DBD; Deposition; SiOxCy |
| 원문파일 | 초록 보기 |
