| 초록 |
In this study, we polymerized by adding PAG(Photo Acid Generator) to Fluorinated polymer which are synthesized by ourself. And we formed over-cladding using a spin coater on si wafer. Then, for etching the formed over-cladding, we observed the changes of etching rate and features of over clad, Fluorinated polymer, surface on the kinds of solvent. Fluorinated polymer was coated on si suvstrate, dried in oven and patterned. And than Over-clad was etched by solvent, such as THF, cyclohexanone, xylene. The Fluorinated polymer was gotten from solution polymerization and Mw was about 40,000~50,000. We have resulted that etching rates and surface conditions could be changed by the difference in a polarity and solubility of mixing solvent. |
