| 초록 |
Nano imprinting lithography (NIL) technology provides a convenient, effective, and low-cost method for the formation of micro- and nanostructures, which can be applied for the liquid crystal display. In this research, nano-scale pattern was formed on the substrate by imprinting and it induced the LC alignment. Two-dimensional grating was formed on substrate by contact imprinting, on which IZO electrode was sputtered while maintaining the original two-dimensional grating. Surface pattern morphology was characterized by AFM. Cell characterization of patterned LC device was performed by using polarized optical microscope and transmittance measurement. |
