| 학회 |
한국화학공학회 |
| 학술대회 |
2005년 가을 (10/21 ~ 10/22, 인하대학교) |
| 권호 |
11권 2호, p.2513 |
| 발표분야 |
재료 |
| 제목 |
Edge transfer lithography of V2O5 nanowires on SiO2 substrate |
| 초록 |
We have transferred V2O5 nanowires to a desired position on a SiO2 substrate by a μ-contact printing (MCP) technique. In MCP procedure on the aminopropyltriethoxysilane (APS) - treated SiO2 substrate, we showed that the hydrophilicity of PDMS stamp affects the transfer mechanism of nanowires. The V2O5 nanowires were transferred through a relief side of the hydrophilic stamp whereas they were along the recess edge of the hydrophobic one forming agglomerated nanowire patterns because V2O5 nanowires do not adhere on the relief sides but are stored in the recess region of the hydrophobic stamp. The width of the transferred pattern could be controlled by the concentration of nanowire solution as well the width of the recess area in the patterned stamp. In this way, we could obtain the reduced line pattern of sub-micrometers compared to the PDMS stamp patterns of a few micrometer sizes. These results suggest that the transfer mechanism of V2O5 nanowires on SiO2 substrate be related to chemical interaction between the stamp and the ink. |
| 저자 |
김용관, 박성준, 구재필, 오동진, 김규태, 하정숙
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| 소속 |
고려대 |
| 키워드 |
V2O5; nanowire; PDMS; Microcontact printing
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| E-Mail |
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| 원문파일 |
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