| 초록 |
Multilayer polymer thin films have significant potential for use as light emitting diodes, nonvolatile memory devices, electrochemical sensors, and nonvolatile memory devices. For making multilayer polymer thin films processes, contrast of hydrophilicity or UV cross-lingking was used. The complex processes are necessary because of second coating solution damage to first layer. So orthogonal processing using fluorine compounds provides simple multilayer polymer thin films processes. In this work, PS-b-PEO or PS-b-P2VP for bottom layer and Poly(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-Heptadecafluorodecyl methacrylate)-block-poly(Lauryl methacrylate) (PHDFMA-b-PLMA) for top layer were used to make nanopattern via its self-assembling process reached through the thermal and solvent annealing. Finally, bottom and top layer have a different nanostructure that can be observed by atomic force microscope after tetrafluoromethane reactive ion etching. |
