| 학회 |
한국재료학회 |
| 학술대회 |
2015년 가을 (11/25 ~ 11/27, 부산 해운대그랜드호텔) |
| 권호 |
21권 2호 |
| 발표분야 |
G. 나노/박막 재료 |
| 제목 |
Enhancement of the Directed Self-assembly Kinetics of Block Copolymers Using Binary Solvent Mixtures |
| 초록 |
The fast pattern generation of highly ordered block copolymer (BCP) nanostructures is practical for next-generation nanolithography applications. However, there remain critical obstacles to achieve the rapid self-assembly of BCPs with a high Flory-Huggins interaction parameter (χ) owing to their slow kinetics. In this presentation, we report that a binary solvent-vapor annealing method can significantly accelerate the self-assembly kinetics of poly(dimethylsiloxane-b-styrene) (PDMS-b-PS) BCPs with a high-χ. In particular, we systemically analyzed the effects of the mixing ratio of a binary solvent composed of a PDMS-selective solvent (heptane) and a PS-selective solvent (toluene), showing an ultrafast self-assembly time (≤ 1 min) to obtain a well-ordered nanostructure. Moreover, we successfully accomplished extremely fast generation of sub-20 nm dot patterns within an annealing time of 10 seconds in a 300-nm-wide trench by means of binary solvent annealing. We believe that these results are also applicable to other solvent-based annealing systems of BCPs and that they will contribute to the realization of next-generation ultrafine lithography applications. |
| 저자 |
김광호1, 윤제문1, 최영중2, 박운익3
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| 소속 |
1하이브리드 인터페이스 기반 미래소재연구단, 2부산대, 3재료공학과 |
| 키워드 |
block copolymer; directed self-assembly; binary solvent; self-assembly kinetics
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| E-Mail |
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