| 초록 |
The plasma polymer films were deposited from hexamethyldisiloxane (HMDSO) on polyethersulfone (PES) under different operating conditions such as r. f. power ranging from 50W to 400W and the deposition time 5min, 10min and 15 min for each as well as at different HMDSO/O2 flow ratio. From FT-IR data, the Si-O-Si bending peak at (820-800) cm-1, the strong Si-O-Si stretching absorption band at (1150-1000) cm-1, the symmetric bending in Si-CH3 at (1270-1260) cm-1 were found but the Si-CH3 bending peak were not found in the spectra for r. f. of 300W and 400W which indicates the decrease in the carbon content for high values of r. f. power, resulting in a more SiO2 –like film. With increasing the oxide thickness, the surface roughness increased. Longer deposition times will make the grain size larger. That is, the thicker barrier layer yields a higher surface roughness. |
