| 초록 |
Nanometer-scale patterning by lithography is required to fabricate electronic and optical devices. Critical issues, sych as resolution, reliability, speed, and overlay accuracy, all need to be addressed in order to develop new lithography methodologies for such demanding, industrially relevant process. Several approaches towards nanostructure fabrication have been exploited without resorting to expensive tools such as those used in deep-UV projection lithography and electron-beam lithography. In our works, we have fabricated the new nano patterning technology enabling to have high resolution and simple process. By using absorption phenomena of SiO2 materials, ultra thin SiO2 patterns are fabricated in large area. |
