| 초록 |
Orientation of block copolymers (BCPs) in thin films is crucial to fully exploit the potential of these materials for applications in nanotechnology. The control of the orientation is challenging as block copolymer nanodomains spontaneously self-assemble in a configuration that minimizes the total free energy of the system. We present a processing route, based on the use of surfactants, to control the orientation of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) thin films. This method formed the perpendicular orientation on the upper part of the film after a very short annealing time, on any substrates. We investigated film thickness effect of this system and observed the morphology changed periodically according to film thickness. We verified the structures and mechanisms of surfactant-assisted perpendicular orientation of thin block films using AFM, SEM, GISAXS and Neutron Reflectivity. |
