학회 |
한국고분자학회 |
학술대회 |
2009년 가을 (10/08 ~ 10/09, 광주과학기술원 오룡관) |
권호 |
34권 2호 |
발표분야 |
고분자 합성 |
제목 |
Selective Chemical Etching of a Rod-Coil Triblock Copolymer Containing Poly(9,9-didodecyl fluorene-2,7-diyl) and Poly(D,L-lactide) |
초록 |
A series of symmetric, semi-crystalline triblock copolymers of poly(D,L-lactide)-b-oligo(9,9-didodecyl fluorene-2,7-diyl)-b-poly(D,L-lactide) (PLA-b-PF-b-PLA) were synthesized by using ring opening polymerization method. Selective chemical etching was performed on the thin films of PLA-b-PF-b-PLA, spin-coated on the Si substrate with different rpms. Prior to chemical etching, the spin-coated films were completely dried and annealed under the atmospheres of selective solvents. These solvent-annealed films were chemically-etched by aqueous NaOH solution which selectively removed the PLA blocks of PLA-b-PF-b-PLA. The surface topologies of the spin-coated films of PLA-b-PF-b-PLA were carefully monitored by atomic force microscopy (AFM) and transmission electron microscopy (TEM). |
저자 |
이성철, 차경진, 김민성, 예새미, 하재희, 권용구
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소속 |
인하대 |
키워드 |
conjugated polymers; fluorene; etching
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E-Mail |
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