| 초록 |
We report a low-temperature fabrication of mixed-organic-inorganic hybrid superlattices. The organic layers were grown by repeated sequential adsorptions of C=C-terminated alkylsilane and metal hydroxyl with ozone activation, which was called “molecular layer deposition (MLD)”. The MLD method is a self-controlled layer-by-layer growth process under vacuum conditions, and is perfectly compatible with the atomic layer deposition (ALD) method. The inorganic layers were grown by ALD, which relies on sequential saturated surface reactions. The advantages of MLD combined with ALD (MLD-ALD) include accurate control of film thickness, large-scale uniformity, excellent conformality, good reproducibility, multilayer processing capability, sharp interfaces, a vast library of possible materials, and excellent film qualities at relatively low temperatures. The MLD-ALD method is an ideal fabrication technique for various flexible electronic devices |
