| 초록 |
Nanoimprint lithography (NIL) is a high-resolution lithography method that enables low-cost, fast production and large-scale nanofabrication. Today, the major challenge to finding the ultimate solution in fabricating nanostructures of less than 10 nm through the NIL process is the ability to create small feature size imprint molds and develop defect-free and precise etching processes. Here we report the sub-10 nm patterning on various substrates via nanoimprint process. With the 100 nm master mold, we first fabricated both soft and hard molds with reduced pattern sizes (50 nm, 20 nm, 10 nm, and 5 nm) using atomic layer deposition of alumina. After surface functionalization of the mold, we imprinted nanoscale patterns on both Si and PET substrates, and resulted in the structures with sub-10 nm pattern size. These results show the possibility of making high-resolution nanopatterning for application in photonic, optoelectronics, and future scale-up nanoelectronics. |
