화학공학소재연구정보센터
학회 한국화학공학회
학술대회 2019년 봄 (04/24 ~ 04/26, 제주국제컨벤션센터)
권호 25권 1호, p.1157
발표분야 신진연구자 심포지엄
제목 Supramolecular dendrimer building block for sub-5nm pattering
초록 Supramolecular dendrimer has numerous advantageous properties for new building block for bottom-up lithography approaches, associated with their small feature size (sub-5nm), short stabilization times required to produce highly ordered structures, and flexible functionalities and structures. In spite of the great advances in the field, it is very difficult to generate large-area single domain ordering using supramolecular dendrimer because of their complex architectures and multiple site for intermolecular interactions. This stands as a major hurdle for wide spread application of dendrimer materials. In the study, we report a simple and general method to create ultra-dense, single domain arrays of dendrimer cylinders (ca. 4.5 nm diameter) over large areas (0.3 mm x 0.3 mm) by utilizing sandwich system. We also demonstrate for the first time use of a supramolecular dendrimer assembly for the formation of a highly ordered nanoparticle array with a high areal density of ~20 Tdot/in2. We believe that the observations made in this effort should serve as the foundation for the design of new routes for bottom-up lithography based on dendrimers.
저자 권기옥
소속 한국생산기술(연)
키워드 supramolecules; dendrimer; self-assembly; bottom-up lithography; nanoparticle array
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