화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2007년 봄 (04/12 ~ 04/13, 제주 ICC)
권호 32권 1호
발표분야 블록공중합체를 이용한 신기능 나노물질 개발 및 분석
제목 Lithography using Block copolymer with Closed-loop Phase Behavior and Baroplasticity
초록 Block copolymers with baroplasticity can be easily processed at a relatively low temperature under moderate pressures. In this work, polystyrene-block-poly(n-pentyl methacrylate)[PS-b-PnPMA] was used for preparing the nano-scale patterning by Atomic force microscope (AFM) probe. We found that the PS-b-PnPMA thin film was easily patterned even by AFM probe at room temperature.
저자 조아라1, 주원철2, 김진곤2
소속 1포항공대, 2포항공과대
키워드 block copolymer; lithography; baroplasticity
E-Mail