학회 |
한국고분자학회 |
학술대회 |
2007년 봄 (04/12 ~ 04/13, 제주 ICC) |
권호 |
32권 1호 |
발표분야 |
블록공중합체를 이용한 신기능 나노물질 개발 및 분석 |
제목 |
Lithography using Block copolymer with Closed-loop Phase Behavior and Baroplasticity |
초록 |
Block copolymers with baroplasticity can be easily processed at a relatively low temperature under moderate pressures. In this work, polystyrene-block-poly(n-pentyl methacrylate)[PS-b-PnPMA] was used for preparing the nano-scale patterning by Atomic force microscope (AFM) probe. We found that the PS-b-PnPMA thin film was easily patterned even by AFM probe at room temperature. |
저자 |
조아라1, 주원철2, 김진곤2
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소속 |
1포항공대, 2포항공과대 |
키워드 |
block copolymer; lithography; baroplasticity
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E-Mail |
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