| 초록 |
Many researchers have studied on the deposition of thin lms on substrates or particles to improve the electrical, magnetic, mechanical and optical properties of substrates or particles. Plasma chemical vapor process can be a good candidate to coat the high quality thin films on particles uniformly.In this study, we used the rotating inductively coupled plasma reactor to coat the TiO2 thin films on the glass, polyethylene and polyprophylene particles, and examined the effects of various process variables on the growth and characteristics of thin films on the particles. As the concentration of TTIP as a precursor of TiO2 thin films increases and the deposition time increases, the thickness of TiO2 thin films on the particles increases. |
