| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 봄 (04/10 ~ 04/11, 컨벤션 뷰로(대전)) |
| 권호 |
33권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Field Induced Oxide Nano-patterning on H-passivated Silicon (111) Substrate Using Carbon Nanotube AFM Probe |
| 초록 |
Atomic Force Microscopy (AFM) field-induced oxidation (FIO) of silicon surfaces is powerful tool for the fabrication of nanoscale device structures, In this study we could make the FIO nanopatterning in a hydrogen passivated silicon (H:Si (111)) substrate with carbon nanotubes (CNT) AFM probes. CNT-AFM probes were fabricated by Langmuir-Blodgett technique. Using this CNT-AFM probe, we made a sub-15 nm lines width line and dots on the (H:Si(111)) substrate. Nanopatterning is accomplished by applying a positive voltage pulse to the H:Si(111) substrate with CNT-AFM probe connected to ground. All of patterning process was used tapping mode AFM. |
| 저자 |
이재혁, 김재호, 김효섭, 강원석
|
| 소속 |
아주대 |
| 키워드 |
AFM; Oxidation; Nano-patterning
|
| E-Mail |
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